A new report in the journal Nanotechnology offers findings of a nanoscale in situ investigation of ultrathin silicon oxide thermal decomposition by high temperature scanning tunneling microscopy. A surface chemical reaction—the thermal decomposition of ultrathin silicon oxide (~1 nm) by ultrahigh vacuum (UHV) thermal annealing at 600–800 °C—is in situ investigated on a … [Read more...]
Thermo-Reflectance Thermography For Submicron Temperature Measurements
The primary approach to maintaining the aggressive progress in the microelectronics industry has been to increase the density of elementary transistors and to reduce the size of their active areas. As a result, the removal of heat generated by various internal system components has become a major design challenge, further complicated by the lack of knowledge of the temperature … [Read more...]
